Introduction
This on-demand webinar addresses the unique challenges encountered in the analysis of ultra-trace metals in semiconductor chemicals. It delves into key features and technologies that enhance ICP-MS performance in this field. Topics covered include the robust 34 MHz RF generator, interface region enhancements for improved matrix tolerance, and the high ion transmission interface delivering enhanced sensitivity. Additionally, the webinar showcases the application of state-of-the-art ICP-MS in analyzing semiconductor chemicals, acids, and photoresists, providing valuable insights for researchers and professionals in the semiconductor industry.
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