Introduction
Testing for impurities in semiconductor process chemicals is primordial. Trace-level ionic or particulates contaminants cause defects that lead to reduced device yield, lower performance, and product failure. While testing for metal contaminants using ICP-MS is an industry standard, monitoring particulate contamination in process chemicals using Single Particle ICP-MS (SP-ICP-MS) is fast growing. Contamination from metallic particles such as iron, chromium, aluminum, silica among others which can be released from IC processing equipment, is of particular concern. In this webinar, you will learn how to setup SP-ICP-MS to monitor multiarticulates in various process chemicals. Covered chemicals: NMP, Sulfuric acid.
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