Introduction
In this webcast, Katsu Kawabata, President, IAS Inc. discusses the sources and requirements of metallic contamination control in semiconductor FAB and the preferred fully automated systems utilizing ICP-MS. The analyses and topics discussed include:
- Wafer analysis using vapor phase decomposition (VPD)-ICP-MS
- Direct analysis of various chemicals using online-ICP-MS
- Direct analysis of various gases using gas exchange device (GED)-ICP-MS
- Risk mitigation of utilizing fully automated system
- IAS Software integrates with PerkinElmer's Syngistix™ software for fully automated online analysis in semiconductor FABs
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