Introduction
During the production of semiconductor devices, it is crucial to ensure that the silicon wafers are free of contaminants and impurities. The use of high-purity chemicals during the cleaning process is critical to the semiconductor product’s overall quality and performance. Therefore, it is essential to analyze electronic-grade hydrochloric acid (HCl) and hydrogen peroxide for the presence of trace metal contaminants.
This work demonstrates the extreme power of the NexION® 5000 multi-quadrupole ICP-MS to remove interferences in order to achieve low background equivalent concentrations in electronic-grade hydrochloric acid for all analytes.
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